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Issue Date	Title Author(s) Journal	View
2023-05	Preparation of wafer-scale highly conformalamorphous hafnium dioxide thin films by atomic layer deposition using a thermally stable boratabenzene ligand-containing hafnium precursor Ansari, Mohd Zahid ; Janicek, Petr ; Park, Ye Jin ; NamGung, Sook ; Cho, Bo Yeon ; Nandi, Dip K. ; Jang, Yujin ; Bae, Jong-Seong ; Hong, Tae Eun ; Cheon, Taehoon ; et al Applied Surface Science, v.620, 2023-05	47
2014-07-01	The effects of nitrogen incorporation on the properties of atomic layer deposited Ru thin films as a direct-plateable diffusion barrier for Cu interconnect Mun, Ki-Yeung ; Hong, Tae Eun ; Cheon, Taehoon ; Jang, Yujin ; Lim, Byoung-Yong ; Kim, Sunjung ; Kim, Soo-Hyun Thin Solid Films, v.562, pp.118 - 125, 2014-07-01	498

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